Development of a System for Producing Stereo Ground Models by Optical Lithography

This paper pr~sents a method oicontroling ultravid ~ t ray5 by utilizing mask p a t t ~ r n s for producing titcreo ground mdpls. The LCD display system waf developed as a substitute for a mask pattern sheet. Usually an ~iliraviniet lnser and r a t e t scanning ate used when producing s t ~ r m odels by o p tical Zithography. Elowever, th is method has some drawharks such as lengthy procedures when producing large objects and the tligll cost of optical lithography rnarhknery. We can produce objects more speedily 1.y using a m ~ s k pat,tern sheet and a low cost lamp can he used in the place of a UV laser.